High Precision Lapping and Polishing Equipments
Lapple's specialized abrasive supply cylinders deliver critical precision in semiconductor surface preparation. Engineered to feed a constant, stable flow of abrasive slurry to lapping and polishing plates, these systems directly optimize process outcomes by minimizing defects.
Our range includes:Cylinder with valve only,Cylinder for peristaltic pump,Cylinder with mixer.
Ensures consistent abrasive delivery for uniform material removal and surface finish.
Maintains slurry purity critical for defect-sensitive semiconductor processes.
Prevents particle settling, clumping, or agglomeration, eliminating flow interruptions and potential surface scratches.
Reduces variability and safeguards against scratches, pits, and other surface damage.
| Materials Involved | PVC | Peek | PVDF | Special material can be customized. |
|---|---|---|---|---|
Typical Size |
Diameter: 150~200mm | Length: 200~400mm | Vol: 1.5L~4L | Special sizes can be customized. |