Suzhou Lapple Technology Co.,Ltd

High Precision Lapping and Polishing Equipments

TC wafer for in-situ temperature profiling

Series:TCW,size from 3"~12".

A TC Wafer is a customizable, instrumented wafer with embedded thermocouples designed for accurate, real-time, in-situ temperature profiling and transient monitoring of semiconductor wafers during processing. It is a critical tool for gaining process confidence, ensuring equipment health, improving uniformity, troubleshooting temperature issues, and ultimately enhancing yield and uptime in semiconductor manufacturing.

It is widely used to monitor and validate the performance of critical semiconductor manufacturing equipment (Etch, PVD, CVD, RTP, Bonders,Hotplates, Ovens, Reflow, etc.).

Process Confidence:

Enables measurement of the actual temperature experienced by the wafer inside the process chamber, leading to greater process control and reliability.

Troubleshooting:

Helps identify root causes of temperature deviations between equipment sets or within a single tool faster.

Uniformity Analysis:

Reveals process temperature uniformity across the wafer.

Uptime Improvement:

Contributes to increased uptime of manufacturing equipment by enabling better process control and faster diagnostics.

TC wafers

Sensor Type Wafer Size Substrate Number of sensors Wire termination Temperature Range
K Type 3~12" Silicon,Sapphire,metal 1~20 Min Plug/D-sub RT~1000℃

*Due to the continuous development of the product, there may be changes in the relevant parameters

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