High Precision Lapping and Polishing Equipments
The Aftex-8000 Series Sample Holder delivers unmatched precision in substrate handling for ECR deposition, combining robust thermal management, contamination-resistant materials, and user-centric design. It maximizes film quality, process yield, and operational flexibility—making it indispensable for advanced thin-film R&D and production.
The Sample Holder is a precision-engineered fixture designed to securely position and stabilize substrates during Electron Cyclotron Resonance (ECR) thin-film deposition processes. It serves as the critical interface between the substrate and the deposition chamber, ensuring optimal exposure to plasma for uniform coating.
Holds wafers, glass, or custom-shaped samples firmly in place to prevent displacement during high-vacuum and plasma operations.
Facilitates controlled heating/cooling of substrates to maintain precise temperature conditions for film growth.
Enables precise angular/tilt adjustments to achieve desired film thickness and stoichiometry across complex geometries.
Engineered for 360° plasma exposure with minimal shadowing, ensuring consistent film thickness and composition edge-to-edge.
| Semiconductor Wafer Coating | Optical/ITO film deposition on glass | Functional coating for MEMS,sensors,or R&D prototypes |
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