AFTEX-8000 Solid-source ECR plasma deposition system that makes it possible to form multi-layer films from a large number of materials.
AFTEX-8000 Solid-source ECR plasma deposition system that makes it possible to form multi-layer films from a large number of materials.
AFTEX-8000 series consists of two (2) ECR plasma sources in a process chamber and C to C automation system which forms very uniform multi-layer films onto 8 inch substrate with high quality for optical films and so on. Solid source ECR plasma deposition is achieved by high activity and high-density ECR plasma source and by putting target at pulling out plasma window.
Any solid material that can be fabricated into a sputtering target can be used as the raw material, so films of various oxides and nitrides can be formed, as well as multi-layer films, by combining them with introduced gases such as oxygen or nitrogen.
For example, if Si is used as the solid source, it is possible to form SiO2, Si3N4, and Si, if Al is used as the solid source, it is possible to form Al2O3 or AlN, Besides, Ta2O5, HfO2, ZrO2, ITO, STO and so on can be formed.
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